1200℃ Mini Gas-Mixing Chemical Vapor Deposition CVD System

Model：KJ-T1200-S5020-IC

Description：

1200℃ Mini Gas-Mixing CVD system comprise of a mini Tube Furnace, a two-channel gas-mixing unit with mass flow meters, a vacuum pump unit of 10Pa.

Range of Application:
It’s mainly used in research of graphene, materials for lithium battery, annealing of crystal, luminescent materials and so on.

Parameters:

Product	1200℃ Mini Gas-Mixing Chemical Vapor Deposition CVD System
Model	KJ-T1200-S5020-IC
Insulation layer	Alumina ceramic fiber
Tube	Quartz, Φ50*800mm.
Heating Zone	200mm
Top Temperature	1200℃
Working Temperature	1100℃
Temperature Control Accuracy	+/- 1℃
Temperature Control	Intellectual 30-segment programmable controller with over-temperature protection (Touchscreen controller is available.)
Sealing	Customizable flanges with gas valves, pressure gauge and so on.
Gas Mixing Unit	Ar, H2, N2 and so on are available. Mass Flow meters Flowing rate accuracy: ±1% FS
Vacuum Pump Unit	Vacuum pump with dust filter Digital pressure gauge
Heating Rate	0-20℃/min (Suggestion: 0-10℃/min)
Heating Element	0Cr27Al7Mo2 resistance wire
Power supply	AC220V, 50Hz (Customizable)
Power	2kW
Temperature Sensor	K-type Thermocouple
Accessories	Crucibles, Crucible Tongs, Gloves, Insulation blocks.
Notes	Pressure higher than 1.02Mpa will break the tube. Since the pressure in the gas cylinder is high, a converter is necessary. The measurement range of our converter is 0.01mpa-0.1mpa, will ensure a safe gas supply. No vacuum condition is allowed when the temperature is higher than 1000℃. Please keep the gas flow lower than 200sccm when the temperature is high to lower the impact of cold air to the hot tube. If you have to keep the valves on the two ends of the tube closed at the same time, please watch the pressure gauge and open the valves once the pressure is higher than 1.02Mpa to avoid any tube breakage.
Certificate	CE, ISO.
After-sale Service	1-year warranty and life-time technical support